Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas. 2000.
Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in … Wikipedia
Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v … Wikipedia
Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… … Wikipedia
Chemical transport reaction — In chemistry, a chemical transport reaction describes a process for purification and crystallization of non volatile solids. The process is also responsible for certain aspects of mineral growth from the effluent of volcanoes. The technique is… … Wikipedia
oxyde de déposition chimique en phase vapeur — cheminiu gariniu būdu nusodintas oksidas statusas T sritis radioelektronika atitikmenys: angl. chemical vapor deposition oxide vok. chemisches Gasphasenabscheidungsoxid, n rus. оксид, сформированный методом химического осаждения из паровой фазы,… … Radioelektronikos terminų žodynas
Zinc oxide — Other names Zinc white Calamine Identifiers … Wikipedia
Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some … Wikipedia
Yttrium barium copper oxide — IUPAC name barium copper yttrium oxide … Wikipedia
Evaporation (deposition) — Evaporation machine used for metallization at LAAS technological facility in Toulouse, France. Evaporation is a common method of thin film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel… … Wikipedia
Lanthanum(III) oxide — Chembox new Name = Lanthanum(III) oxide ImageFile = Lanthanum(III) oxide.jpg ImageName = Lanthanum(III) oxide IUPACName = Lanthanum(III) oxide OtherNames = Lanthanum sesquioxide Lanthana Section1 = Chembox Identifiers CASNo = 1312 81 8 RTECS =… … Wikipedia
